dor_id: 41513

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856.4.0.u: https://rmf.smf.mx/ojs/rmf/article/view/3642/3609

100.1.#.a: Sar{\i}kavak, B.; Öztürk, M. K.; Altunta\c{s}, H.; Mammedov, T. S.; Alt{\i}ndal, \c{S}.; Özçelik.

524.#.#.a: Sar{\i}kavak, B., et al. (2008). MBE-growth and characterization of InxGa1-xAs/GaAs (x=0.15) superlattice. Revista Mexicana de Física; Vol 54, No 6: 416-0. Recuperado de https://repositorio.unam.mx/contenidos/41513

245.1.0.a: MBE-growth and characterization of InxGa1-xAs/GaAs (x=0.15) superlattice

502.#.#.c: Universidad Nacional Autónoma de México

561.1.#.a: Facultad de Ciencias, UNAM

264.#.0.c: 2008

264.#.1.c: 2008-01-01

653.#.#.a: MBE; X-Ray diffraction; series resistance; interface states; temperature dependent

506.1.#.a: La titularidad de los derechos patrimoniales de esta obra pertenece a las instituciones editoras. Su uso se rige por una licencia Creative Commons BY-NC-ND 4.0 Internacional, https://creativecommons.org/licenses/by-nc-nd/4.0/legalcode.es, fecha de asignación de la licencia 2008-01-01, para un uso diferente consultar al responsable jurídico del repositorio por medio de rmf@ciencias.unam.mx

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001.#.#.#: oai:ojs.rmf.smf.mx:article/3642

041.#.7.h: eng

520.3.#.a: A qualified In 0.15 Ga 0.85 As/GaAs superlattice was grown on an n-type GaAs(100) substrate by molecular beam epitaxy(MBE). Analysis of this structure was first carried out by X-Ray diffraction(XRD) and this structure's the interface thicknesses, roughness and x concentration determined at nanoscale. Secondly, the electrical characteristics of this sample such as the current-voltage-temperature (I-V-T), capacitance-voltage-temperature (C-V-T) and conductance-voltage temperature (G-V-T) were studied over a wide temperature range. The energy distribution of interface states was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. Experimental results show that the forward and reverse I-V characteristics are similar to Schottky-junction behavior. The ideality factor n, series resistance R s , barrier height \Φ Band density of interface states N sswere found to be strong functions of temperature. According to thermionic emission (TE) theory, the zero-bias barrier height (\φBo ) calculated from forward bias I-V characteristics was found to increases with increasing temperature. In addition, the value of R sas a function of both voltage and temperature was obtained from C-V and G-V characteristics. The temperature dependent of I-V, C-V and G-V characteristics confirmed that the distribution the R sand N ssare important parameters that influence the electrical characteristics of these devices.

773.1.#.t: Revista Mexicana de Física; Vol 54, No 6 (2008): 416-0

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Artículo

MBE-growth and characterization of InxGa1-xAs/GaAs (x=0.15) superlattice

Sar{\i}kavak, B.; Öztürk, M. K.; Altunta\c{s}, H.; Mammedov, T. S.; Alt{\i}ndal, \c{S}.; Özçelik.

Facultad de Ciencias, UNAM, publicado en Revista Mexicana de Física, y cosechado de Revistas UNAM

Licencia de uso

Procedencia del contenido

Entidad o dependencia
Facultad de Ciencias, UNAM
Revista
Repositorio
Contacto
Revistas UNAM. Dirección General de Publicaciones y Fomento Editorial, UNAM en revistas@unam.mx

Cita

Sar{\i}kavak, B., et al. (2008). MBE-growth and characterization of InxGa1-xAs/GaAs (x=0.15) superlattice. Revista Mexicana de Física; Vol 54, No 6: 416-0. Recuperado de https://repositorio.unam.mx/contenidos/41513

Descripción del recurso

Autor(es)
Sar{\i}kavak, B.; Öztürk, M. K.; Altunta\c{s}, H.; Mammedov, T. S.; Alt{\i}ndal, \c{S}.; Özçelik.
Tipo
Artículo de Investigación
Área del conocimiento
Físico Matemáticas y Ciencias de la Tierra
Título
MBE-growth and characterization of InxGa1-xAs/GaAs (x=0.15) superlattice
Fecha
2008-01-01
Resumen
A qualified In 0.15 Ga 0.85 As/GaAs superlattice was grown on an n-type GaAs(100) substrate by molecular beam epitaxy(MBE). Analysis of this structure was first carried out by X-Ray diffraction(XRD) and this structure's the interface thicknesses, roughness and x concentration determined at nanoscale. Secondly, the electrical characteristics of this sample such as the current-voltage-temperature (I-V-T), capacitance-voltage-temperature (C-V-T) and conductance-voltage temperature (G-V-T) were studied over a wide temperature range. The energy distribution of interface states was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. Experimental results show that the forward and reverse I-V characteristics are similar to Schottky-junction behavior. The ideality factor n, series resistance R s , barrier height \Φ Band density of interface states N sswere found to be strong functions of temperature. According to thermionic emission (TE) theory, the zero-bias barrier height (\φBo ) calculated from forward bias I-V characteristics was found to increases with increasing temperature. In addition, the value of R sas a function of both voltage and temperature was obtained from C-V and G-V characteristics. The temperature dependent of I-V, C-V and G-V characteristics confirmed that the distribution the R sand N ssare important parameters that influence the electrical characteristics of these devices.
Tema
MBE; X-Ray diffraction; series resistance; interface states; temperature dependent
Idioma
eng
ISSN
2683-2224 (digital); 0035-001X (impresa)

Enlaces